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Virtualization HW Assist Virtualization SW Supported Virtualized I/0 (networking and storage) capabilities Unlimited virtualized I/O with integrated management; sharing of storage, HBAs and NICs; pooled MAC addresses

400 450 500 Wavelength (nm)

(4 3 5)

215 Substitution for (c,)^ from Eq. (4.3.5) into Eq. (4.3.4) and then for p in Eq. (4.3.3) yields the Poisson-Boltzmann differential equation

SMP Support (max #)

Figure 13.25. Photo and thermal isomerization of azobenzene ligands in the photoresponsive aerogel. (a) As-prepared, (b) after UV irradiation of sample (a) for 40 min, (c) after room light exposure of sample (b) for 60 min, (d) after heating sample (b) to 1001C for 10 min.

(4-3-6)

cis conformation in the as-prepared lm. Using a molar absorption coef cient (e) of 2.59 104 M 1 cm 1 for the trans isomer of TSUA, the concentration of the trans isomer in the lm was estimated to be 0.27, 0.22, 0.20, and 0.17 M for lm samples in Fig. 13.25d, a, c and b, respectively. It is dif cult to estimate the concentration of the cis isomer in the lm because the e value of the n p* transition of the cis isomer is unknown. It is reasonable that a portion of the azobenzene ligands are in the cis conformation because the gel shrinkage during the lm formation process caused by ethanol evaporation leads to a portion of the azobenzene ligands adopting the cis conformation with shorter molecular length. Only upon powerful stimulation (heat) to overcome the force (B200 pN/ azobenzene ligand [Hugel et al., 2002]) involved in the conformational change does the cis isomer change to the trans isomer that has a longer molecular length. 13.4.2.3. Stress Development and Relaxation of Azobenzene-Modi ed Polysilsesquioxane Gels. The dimensional change associated with the trans 2cis isomerization of the azobenzene ligands contained in the polysilsesquioxane gel lms causes the gel network to shrink or expand in response to light stimuli, which involves stress development and relaxation of the lm. Brinker and coworkers used a homemade beam bending setup to observe the stress behavior in response to UV light irradiation. The in-plane stress during alternating UV light exposure and dark exposure is calculated from Stoney s equation as follows: s Es ds2 d Vs df

Supported Interconnect - GbE, 10GbE, IB(2X, 4X, etc) FC (2,4,8 ), etc IB 4X (2-12 links per server), and HyperTransport (2-4 per server)

with the boundary conditions d0/d* = 0, (p = 0 for x >o . This differential equation can be readily solved after multiplying both sides by d0/dx\ Integration from x to infinity then gives (the concentration in the bulk of the solution being denoted as ct rather than (c^^o)

3L2 1

The Gauss theorem ( ) = (4.3.8)

GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare GbE, 10GbE, IB (4x/8X), FC (2/4), SolarFlare

where s is the in plane biaxial stress, Es is Young s modulus of the silicon substrate (1.48 1012 dynes/cm2), ds is the substrate thickness (75 mm), L is the substrate length, Vs is Poisson s ratio of the silicon substrate (0.18), df is the lm thickness, and d is the measured de ection of the silicon substrate (Fig. 13.26). Tensile stress corresponds to a positive de ection (d), which is in an upward direction. Negative d generates contraction stress. Stoney s equation is valid, provided dscdf, dscd, L is greater than twice the width of the substrate, and the elastic modulus of the substrate is much larger than that of the lm. The photoresponsive gel lms were deposited on the silicon substrates using the casting or dip-coating methods. Figure 13.27 shows a typical stress response of the photoresponsive gel lms (225 nm in thickness) in situ during UV light exposure. Before the UV light (l = 320 nm) was turned on, the beam-bending system was zeroed by stabilizing it for half an hour. After the UV light was turned on, the tensile stress (positive direction) that comes from the trans-cis isomerization of the azobenzene ligands increases rapidly to a plateau value of ca. 0.58 MPa in 2 min. The extended UV light irradiation for ca. 26 min did not change the plateau value, which was the photostationary state of the trans-cis isomerization. Then the UV light was turned off and the whole system was kept in the dark. The corresponding cis-trans thermal isomerization caused the stress

allows calculation of the charge ad in a column with unit cross-section in the diffuse layer: (4.3.9) If this equation is employed for a solution of a single valence-symmetrical electrolyte {z+ = z_ = z)> then